Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications
Book Details
Format
Hardback or Cased Book
ISBN-10
1498783597
ISBN-13
9781498783590
Publisher
Taylor & Francis Inc
Imprint
CRC Press Inc
Country of Manufacture
US
Country of Publication
GB
Publication Date
Jun 6th, 2017
Print length
154 Pages
Weight
384 grams
Dimensions
16.10 x 24.10 x 1.60 cms
Product Classification:
NanotechnologyElectrical engineeringCircuits & components
AI Summary
Ksh 27,900.00
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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
This book focusses on the spacer engineering aspects of novel MOS-based devicecircuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
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