Plasma Etching : Fundamentals and Applications
by
M. Sugawara
Book Details
Format
Hardback or Cased Book
Book Series
Series on Semiconductor Science and Technology
ISBN-10
019856287X
ISBN-13
9780198562870
Publisher
Oxford University Press
Imprint
Oxford University Press
Country of Manufacture
GB
Country of Publication
GB
Publication Date
May 28th, 1998
Print length
356 Pages
Weight
743 grams
Dimensions
24.20 x 16.30 x 2.30 cms
Product Classification:
Plasma physicsApplied physicsElectrical engineeringElectronics engineering
AI Summary
Ksh 40,850.00
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
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