CMOS Plasma and Process Damage
by
Kirk Prall
Book Details
Format
Hardback or Cased Book
ISBN-10
3031890280
ISBN-13
9783031890284
Publisher
Springer International Publishing AG
Imprint
Springer International Publishing AG
Country of Manufacture
GB
Country of Publication
GB
Publication Date
May 17th, 2025
Print length
466 Pages
AI Summary
Ksh 19,800.00
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Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
Get CMOS Plasma and Process Damage by at the best price and quality guaranteed only at Werezi Africa's largest book ecommerce store. The book was published by Springer International Publishing AG and it has pages.
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